POST TREATMENT STEP FOR REMOVAL AND REDUCTION OF EXCESS PEROXIDE AND ACID FROM PROCESSED SULFOLANE
Original Publication Date: 2001-Jun-30
Included in the Prior Art Database: 2004-Apr-09
Xerox Disclosure Journal
Disclosed is a method for the removal and reduction of hydrogen peroxide and residual acid from processed sulfolane (tetramethylene sulfone) sources. Sulfolane is a high boiling, stable, highly polar and water-soluble compound, which is an excellent co-solvent for thermal ink jet inks. Its structure is depicted in Example 1.