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SYSTEM AND METHOD FOR OVERLAY MEASUREMENT

IP.com Disclosure Number: IPCOM000029259D
Publication Date: 2004-Jun-21

Publishing Venue

The IP.com Prior Art Database

Related People

Inventors:
Michael MATUSOVSKY Yigal KATZIR
Other Related People:

Abstract

a method for fabricating an integrated circuit, including: forming an image of a target portion of an electrical circuit on a photosensitive layer deposited on a substrate; illuminating an alignment target in the image with substantially monochrome light having a given wavelength (λ); viewing the alignment target through a part of a field of view of a microscope, wherein the part of the field of view is smaller than 2000 μm2 and has an optical path that is generally aberration free to a degree of at least λ/25; and analyzing the viewed alignment target through said part of a field of view to determine a location of the target portion relative to a previously formed portion of said electrical circuit on the substrate.