The following operators can be used to better focus your queries.
( ) , AND, OR, NOT, W/#
? single char wildcard, not at start
* multi char wildcard, not at start
(Cat? OR feline) AND NOT dog?
Cat? W/5 behavior
(Cat? OR feline) AND traits
Cat AND charact*
This guide provides a more detailed description of the syntax that is supported along with examples.
This search box also supports the look-up of an IP.com Digital Signature (also referred to as Fingerprint); enter the 72-, 48-, or 32-character code to retrieve details of the associated file or submission.
Concept Search - What can I type?
For a concept search, you can enter phrases, sentences, or full paragraphs in English. For example, copy and paste the abstract of a patent application or paragraphs from an article.
Concept search eliminates the need for complex Boolean syntax to inform retrieval. Our Semantic Gist engine uses advanced cognitive semantic analysis to extract the meaning of data. This reduces the chances of missing valuable information, that may result from traditional keyword searching.
Ion milling is used to round the edges of a slider in an additional special etching step where a continuously titled ion beam is directed over the edge of a photoresist
English (United States)
This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
100% of the total text.
Page 1 of 2
Single edge rounding
The principle is shown in figure 1. The photo resist is used to shadow a part of the slider substrate. This shadow will be changed due to different tilting angles of the Ion Mill pallet. Setting angle and etching time controls the shape of the edge .
Figure 1: principle
To prevent redeposition on the rising edge of the photo resist the process starts with a small angle (step 1-large shadow) and ends with a steep angle (step 8-small shadow). To avoid overheating of the slider by the ion beam at great tilting angles (e.g. step 5-8) cooling steps are provided by closing the shutter for a few minutes.
The feasibility of the method was demonstrated with a simplified photo mask and a Tencor scan shown in figure 2. Figure 3 shows the result of the Tencor scan. No redeposition material has been detected.
etching areaslider substrate
Figure 2: schematics of a used photo mask
[This page contains 2 pictures or other non-text objects]
Page 2 of 2
0 16 32 47 63 79 95 111 126 142 158
Scan Length (µm)
Figure 3: result of Tencor Scan
[This page contains 1 picture or other non-text object]