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Combined E-Beam and Ion Beam for Circuit Edits Disclosure Number: IPCOM000030140D
Publication Date: 2004-Jul-29

Publishing Venue

The Prior Art Database


Disclosed is a method that consists of an electron beam (E-beam) and back scatter electron detector, in addition to the standard ion beam which performs the milling. The electron image "sees" the circuit below the silicon surface by imaging to depths which are not "seen" by the focused ion beam (FIB) image.