Combined E-Beam and Ion Beam for Circuit Edits
Publication Date: 2004-Jul-29
The IP.com Prior Art Database
Disclosed is a method that consists of an electron beam (E-beam) and back scatter electron detector, in addition to the standard ion beam which performs the milling. The electron image "sees" the circuit below the silicon surface by imaging to depths which are not "seen" by the focused ion beam (FIB) image.