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Method for removing small particles from EUV photomasks

IP.com Disclosure Number: IPCOM000030169D
Publication Date: 2004-Jul-30
Document File: 3 page(s) / 76K

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for removing small particles from extreme ultraviolet (EUV) photomasks. Benefits include improved functionality, improved performance, and improved power performance.