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Method for low power, low temperature oxide for a polished ILD

IP.com Disclosure Number: IPCOM000030170D
Publication Date: 2004-Jul-30
Document File: 3 page(s) / 97K

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for low power, low temperature oxide for a polished interlayer dielectric (ILD). Benefits include improved functionality and improved performance.