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Magnetic Mask for Topological Difficult Geometries Disclosure Number: IPCOM000033680D
Publication Date: 2004-Dec-23

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A fast way of patterning films with metal through physical deposition (thermal vapor deposition, sputtering, e-beam deposition etc.) is to use rigid masks. The masks have to be thin and close to the surface to avoid shadow effects. This can be particular difficult with topological difficult geometries such as a ring.