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Interferometric Monitor of Substrate Heating Induced by Pulsed Laser Irradiation

IP.com Disclosure Number: IPCOM000034210D
Original Publication Date: 1989-Jan-01
Included in the Prior Art Database: 2005-Jan-27

Publishing Venue

IBM

Related People

Authors:
Saenger, KL [+details]

Abstract

A technique is described whereby an interferometric apparatus monitors substrate heating when induced by pulsed laser irradiation. It is a contactless calorimetry apparatus which provides quantitative and rapid time scale measurements of thermal properties. The concept is particularly useful in the non-destructive studies of radiation-induced transient heating and related phenomena. The interferometric apparatus is designed to monitor the interaction of pulsed laser light with an absorbing substrate by detecting the reflected intensity of a non-absorbing probe beam. The beam is sensitive to the optical path length difference between interfering reflections from a substrate's front and back surfaces.