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Planetary Motion in Sputter Systems

IP.com Disclosure Number: IPCOM000034353D
Original Publication Date: 1989-Feb-01
Included in the Prior Art Database: 2005-Jan-27

Publishing Venue

IBM

Related People

Authors:
Chapman, SG Friedman, JD [+details]

Abstract

Uniformity of deposition in some conventional sputtering systems is not adequate for magnetic optical requirements. A method and apparatus is disclosed to rotate substrates within a sputtering system by utilizing the existing table rotation. It requires minimal modification to the tool and is removable. A floating gear wheel, constrained to rotate on the drive table, is locked in place by an extension of the shutter support rod. As the table rotates below the gear wheel, meshing gears on each of the substrate holders are forced to turn. (Image Omitted) Fig. 1 illustrates the table arrangement. The substrate holder moves in from the left, and the carrier drops and locates the shafts into holes 10, while meshing gears 12. The drive table then rises and locates pins 15 into the floating gear.