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Dual Microscope Semiconductor Wafer Inspection Machine

IP.com Disclosure Number: IPCOM000034660D
Original Publication Date: 1989-Mar-01
Included in the Prior Art Database: 2005-Jan-27

Publishing Venue

IBM

Related People

Authors:
Gasper, A Jordan, S Morgado, EJ Stewart, RA [+details]

Abstract

A technique is described whereby a dual microscope inspection machine provides a semi-automatic means of detecting and recording particles and imperfections appearing on the surface of semiconductor wafers. The machine consists of four major components: a wafer handler, a vibration isolation bench assembly, a dual microscope plate assembly, and electrical control cabinet assembly. In the semiconductor wafer fabrication process, inspection and measurement procedures are used to maintain product quality. The machine described herein is designed to aid an operator in this inspection process.