Browse Prior Art Database

Using Capacitance Measurements to Localize the Position of Opens in Serpentine Metal Lines

IP.com Disclosure Number: IPCOM000034675D
Original Publication Date: 1989-Apr-01
Included in the Prior Art Database: 2005-Jan-27

Publishing Venue

IBM

Related People

Authors:
Kasper, M Seifert, HG Zink, J [+details]

Abstract

A widely applied method of checking the process performance of semiconductor chip production uses serpentine metal lines. For yield analysis, resistance measurements of opens and shorts between the serpentine parts are sufficient. However, for analyzing the cause of a fault, its position has to be known. For this purpose, the capacitance of the serpentine is measured with respect to an insulated conductive sublayer. The values thus obtained are a direct measure of the position of the open. As the capacitance may be measured from either side of the serpentine, one or two opens are accurately localized. More than two opens (which are rather unlikely to occur in products) are detected as two opens.