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Laser Micro-Fabrication of Waveguide Devices Disclosure Number: IPCOM000034732D
Original Publication Date: 1989-Apr-01
Included in the Prior Art Database: 2005-Jan-27

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Fan, B Grebe, K Krauss, T Oprysko, MM [+details]


A technique is described whereby high quality waveguide structures are fabricated with laser micro-fabrication techniques. The concept concentrates on the fabrication of Ti:LiNbO3 waveguides including straight lines, Y-branches, curves and similar active optical devices, utilizing direct patterning of "spin-on" organometallic inks. The process steps used to fabricate titanium lithium niobate waveguide devices is similar to those used in the fabrication of semiconductor devices, namely, the deposition of a blanket film of Ti, coating with resist, exposure through a mask, development of a resist, etching of the Ti, and diffusion in a controlled atmosphere. However, the steps required to delineate the waveguide features is time consuming and is usually gated by the mask.