Browse Prior Art Database

Method for Microlithography Without Resist

IP.com Disclosure Number: IPCOM000034830D
Original Publication Date: 1989-Apr-01
Included in the Prior Art Database: 2005-Jan-27

Publishing Venue

IBM

Related People

Authors:
Aviram, A Chandrashekhar, GV [+details]

Abstract

The use of the Scanning Tunneling Microscope (STM) for direct writings of sub-micron metallic features is described in the prior art. One such article in the prior art, shows deposition of 25 nm lines in a vacuum chamber loaded with some organometallic gas that decomposes under the STM tip and deposits metal lines and dots on silicon. Another example describes nanometer scale structures produced by electric field induced local crystallization of glasses. This article describes an approach based on the observation that when silver beta alumina is exposed to electron beam radiation the mobile silver ions in the crystal are drawn to the surface where they are reduced to silver metal by the electron beam and nucleate as silver filaments. The filaments are 25Ao in diameter and can be grown to micron size length.