Browse Prior Art Database

NEAR TRANSPARENT VERY THIN Cr FILMS FOR LIQUID CRYSTAL DISPLAY ELECTRODE AND GATE LINE ADHESION LAYER

IP.com Disclosure Number: IPCOM000035059D
Original Publication Date: 1989-May-01
Included in the Prior Art Database: 2005-Jan-28

Publishing Venue

IBM

Related People

Authors:
Beckerman, M Griffith, JH Smith, GW Souk, JH [+details]

Abstract

Very thin (20 to 30 Ao) Cr thin films can replace conventionally used Indium Tin Oxide (ITO) electrode layers for liquid crystal displays. This replacement offers savings up to three processing steps in Liquid Crystal/Thin Film Transistor (LC/TFT) displays including the elimination of a high temperature annealing step of ITO films. ITO is widely used as a transparent electrode material because of its electrically conductive and near transparent nature. Conventionally, ITO films have been vacuum deposited in many ways (DC sputtering, RF sputtering, reactive evaporation or chemical vapor deposition) to produce transparent conducting coatings on glass.