Dismiss
The InnovationQ application will be updated on Sunday, May 31st from 10am-noon ET. You may experience brief service interruptions during that time.
Browse Prior Art Database

Extended Focal Depth Optical Microlithography

IP.com Disclosure Number: IPCOM000035125D
Original Publication Date: 1989-Jun-01
Included in the Prior Art Database: 2005-Jan-28

Publishing Venue

IBM

Related People

Authors:
Starikov, A [+details]

Abstract

It is proposed to improve the operation of optical lithography tools used in semiconductor manufacturing operations so as to minimize the defocus effect caused by the vertical topography on the wafers. The proposal suggests that the wafer be moved through the focus to lessen the defocus effects. This will serve to compensate for the shallow depth of focus of the tool and the resulting problem of image size variation.