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Indirect Optical Endpoint Monitoring Disclosure Number: IPCOM000035195D
Original Publication Date: 1989-Jun-01
Included in the Prior Art Database: 2005-Jan-28

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Bartha, J Greschner, J Kempf, J [+details]


The plasma etching of wafers is interferometrically monitored, using, in lieu of a laser beam, light emitted from the excited plasma as a source of monochromatic light.