Browse Prior Art Database

Indirect Optical Endpoint Monitoring

IP.com Disclosure Number: IPCOM000035195D
Original Publication Date: 1989-Jun-01
Included in the Prior Art Database: 2005-Jan-28

Publishing Venue

IBM

Related People

Authors:
Bartha, J Greschner, J Kempf, J [+details]

Abstract

The plasma etching of wafers is interferometrically monitored, using, in lieu of a laser beam, light emitted from the excited plasma as a source of monochromatic light.