Method of Determining the Thickness of Diffusion-Controlled CVD Layers
Original Publication Date: 1989-Jul-01
Included in the Prior Art Database: 2005-Jan-28
Many refractory materials can be effectively grown by diffusion-controlled CVD (chemical vapor deposition). As the growth of layers thus formed is non-linear, an accurate and independent method of determining the final thickness is necessary and will be described below.