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Method of Determining the Thickness of Diffusion-Controlled CVD Layers

IP.com Disclosure Number: IPCOM000035663D
Original Publication Date: 1989-Jul-01
Included in the Prior Art Database: 2005-Jan-28

Publishing Venue

IBM

Related People

Authors:
Briska, M Faix, W Kaercher, R Mueller, K Schramm, W [+details]

Abstract

Many refractory materials can be effectively grown by diffusion-controlled CVD (chemical vapor deposition). As the growth of layers thus formed is non-linear, an accurate and independent method of determining the final thickness is necessary and will be described below.