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Sensitivity Enhancement of Photopolymers in PCM Systems by Ball Milling

IP.com Disclosure Number: IPCOM000035696D
Original Publication Date: 1989-Aug-01
Included in the Prior Art Database: 2005-Jan-28

Publishing Venue

IBM

Related People

Authors:
Brunsvold, WR Conley, WE Crockatt, DM David, LD Skinner, MP [+details]

Abstract

An economical method is described for enhancing the sensitivity of photopolymers used for photoresist processing in PCM systems.