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E-Beam Multi-Layer Metal Wafer Registration Without Blockouts Disclosure Number: IPCOM000035704D
Original Publication Date: 1989-Aug-01
Included in the Prior Art Database: 2005-Jan-28

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Viccica, T Yerdon, RJ [+details]


It is proposed to minimize large blocked out areas written on E-beam lithography tools used for semiconductor processing. The proposal suggests writing new wafer alignment registration marks (WARMs) on previously used sites and registering over scan marks from prior levels of exposure.