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Selective Modification of Resist Sidewall Profiles With a Post Development Bake

IP.com Disclosure Number: IPCOM000035744D
Original Publication Date: 1989-Aug-01
Included in the Prior Art Database: 2005-Jan-28

Publishing Venue

IBM

Related People

Authors:
Klaus, DP Kwietniak, KT Rosenfield, MG [+details]

Abstract

Disclosed is a method to selectively modify the sidewall profiles of isolated spaces and contact holes in novalac-based resist systems. (Image Omitted)