Browse Prior Art Database

Reversible Photosensitive Masking Media for Semiconductor Photolithography Disclosure Number: IPCOM000035820D
Original Publication Date: 1989-Aug-01
Included in the Prior Art Database: 2005-Jan-28

Publishing Venue


Related People

Fredericks, EC [+details]


Through the utilization of a mixture of appropriate materials, a method of masking several photolayers of a semiconductor, a printed circuit board or a packaging substrate with one photo mask is achieved.