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Reversible Photosensitive Masking Media for Semiconductor Photolithography

IP.com Disclosure Number: IPCOM000035820D
Original Publication Date: 1989-Aug-01
Included in the Prior Art Database: 2005-Jan-28

Publishing Venue

IBM

Related People

Authors:
Fredericks, EC [+details]

Abstract

Through the utilization of a mixture of appropriate materials, a method of masking several photolayers of a semiconductor, a printed circuit board or a packaging substrate with one photo mask is achieved.