Browse Prior Art Database

Mechanism for Batch Wafer Notch Alignment

IP.com Disclosure Number: IPCOM000035864D
Original Publication Date: 1989-Aug-01
Included in the Prior Art Database: 2005-Jan-28

Publishing Venue

IBM

Related People

Authors:
Maring, SJ Spoor, TW [+details]

Abstract

A device which uses a notching cam for alignment of semiconductor wafers has been developed which provides improved accuracy over procedures which use the flat of the wafer for alignment.