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A device which uses a notching cam for alignment of semiconductor wafers has been developed which provides improved accuracy over procedures which use the flat of the wafer for alignment.
English (United States)
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Mechanism for Batch Wafer Notch Alignment
A device which uses a notching cam for alignment of semiconductor wafers
has been developed which provides improved accuracy over procedures which
use the flat of the wafer for alignment.
In the manufacture of semiconductor wafers, alignment of the wafers in their
carrier is significant in processing operations. Fig. 1 shows a mechanism which
uses a notching cam 1 which engages a notch in the wafer 5 as it is rotated by
drive rollers 2 while in the cassette carrier 6. The notching cam rotates on a pivot
shaft 3 with a fixed shaft 4 as part of the mechanism which stops the rotation of
the cam when the notch is engaged by the cam 1 thereby stopping the rotation of
In Fig. 2A, on one end of the cam is the notching surface 7 which is
machined to closely approximate the notch 9 on the wafer. The counterweight 8
on the other end of the cam 1 provides the mass which determines the contact
force of the tip against the wafer and the response time for the cam to engage
the notch as shown in Fig. 2B.
The new method has much greater accuracy than the previous one shown in
Fig. 3A which used a single roller 10 to drive the wafer with the flat. In that
method when the flat reached the roller, the wafer would stop rotating and drop
down onto side plates 12 (Fig. 3B).
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