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Electron Beam Data Splitting for Electron Beam Projection Mask Making

IP.com Disclosure Number: IPCOM000035868D
Original Publication Date: 1989-Aug-01
Included in the Prior Art Database: 2005-Jan-28

Publishing Venue

IBM

Related People

Authors:
Clark, TC Grenon, BJ [+details]

Abstract

Two electron beam (EB) projection masks are usually required to generate a single integrated circuit (IC) level to avoid loss of opaque regions which are completely bounded by transmissive (open) regions. Writing EB projection masks with an EB system thus requires splitting data for a complete mask into two sets resulting in a pair of masks having no lost opaque regions. Additionally, in this new technique, data is split between the pair to minimize proximity effects. Higher density of circuit elements or minimization of calculation time for beam parameter adjustment to compensate for proximity is achieved.