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Method of Modifying the Wall Profile of Resist Patterns

IP.com Disclosure Number: IPCOM000036014D
Original Publication Date: 1989-Aug-01
Included in the Prior Art Database: 2005-Jan-28

Publishing Venue

IBM

Related People

Authors:
Kreuter, V [+details]

Abstract

By the controlled reimplementation of solvent into an exposed resist layer prior to its development, the wall profile and the dimensions of openings in the developed resist pattern are controlled.