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By the controlled reimplementation of solvent into an exposed resist layer prior to its development, the wall profile and the dimensions of openings in the developed resist pattern are controlled.
English (United States)
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Method of Modifying the Wall Profile of Resist Patterns
By the controlled reimplementation of solvent into an exposed resist layer
prior to its development, the wall profile and the dimensions of openings in the
developed resist pattern are controlled.
Having been applied, prebaked, exposed and postbaked, the resist layer is
exposed to the vapor of the solvent (such as butylacetate) to be implemented.
The implemented amount of solvent depends on the time the resist is exposed to
the solvent and the vapor pressure. The nature of the solvent is not critical. The
implementation increases the solubility of the resist and decreases the angle of
inclination the walls of the openings in the resist form with the horizontal.
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