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Resistless Patterning of Refractory Films Disclosure Number: IPCOM000036022D
Original Publication Date: 1989-Aug-01
Included in the Prior Art Database: 2005-Jan-28

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Brady, MJ Davidson, A Palevski, A [+details]


One of the common problems in the patterning of the high temperature superconductor (e.g., YBa1Cu2O3) is that it requires elevated substrate temperatures. To obtain a high transition temperature and a sharp resistive transition, the film is typically deposited on MgO substrates heated to 500oC. Conventional lithographic techniques using resists are not compatible with this requirement. A method is described for preparing MgO substrates to facilitate patterning of the substrate prior to the deposition. This method is particularly suitable for first-level metal deposition and provides planarization for subsequent processing. Further, the process does not involve the use of any chemical that is likely to degrade the intrinsic properties of the film.