Browse Prior Art Database

FLASH-ANNEALED PROCESS FOR HIGH Tc SUPERCONDUCTING FILMS

IP.com Disclosure Number: IPCOM000036030D
Original Publication Date: 1989-Aug-01
Included in the Prior Art Database: 2005-Jan-28

Publishing Venue

IBM

Related People

Authors:
Cuomo, JJ Guarnieri, CR Krusin-Elbaum, L Roy, RA Shivashankar, SA Yee, DS [+details]

Abstract

Films of amorphous, mixed amorphous microcrystalline or micro-crystalline mixed phase YBa2Cu3Ox deposited onto substrates have been flash- annealed with suitable thermal bias to produce the structure as well as the electrical characteristics of the high Tc superconductor materials. Films deposited at temperatures from room temperature to about 600oC are post-annealed by thermally biasing the film from 500oC to about 750oC and then creating thermal excursions, for example, to 950oC to 1050oC for a second to many seconds for a few cycles to many cycles. For example, a thermal bias near the phase transition can be established and programmed. Rapid thermal anneal sequences are initiated to produce the proper phase and then maintained to establish the proper defect structure.