Browse Prior Art Database

Focused Airflow Class 1 Working Volume for Semiconductor Processing

IP.com Disclosure Number: IPCOM000036117D
Original Publication Date: 1989-Sep-01
Included in the Prior Art Database: 2005-Jan-28

Publishing Venue

IBM

Related People

Authors:
Mueller, RP Via, GG [+details]

Abstract

This article describes a novel approach to the creation and maintenance of a clean room environment which minimizes the cost associated with air handling, eliminates the design and construction of vertical laminar flow clean rooms, and allows operations to be conducted in a protected environment where just cap and gown may be adequate to assist in the wafer processing.