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Focused Airflow Class 1 Working Volume for Semiconductor Processing Disclosure Number: IPCOM000036117D
Original Publication Date: 1989-Sep-01
Included in the Prior Art Database: 2005-Jan-28

Publishing Venue


Related People

Mueller, RP Via, GG [+details]


This article describes a novel approach to the creation and maintenance of a clean room environment which minimizes the cost associated with air handling, eliminates the design and construction of vertical laminar flow clean rooms, and allows operations to be conducted in a protected environment where just cap and gown may be adequate to assist in the wafer processing.