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Spray Development Indicator and Sensing System

IP.com Disclosure Number: IPCOM000036130D
Original Publication Date: 1989-Sep-01
Included in the Prior Art Database: 2005-Jan-28

Publishing Venue

IBM

Related People

Authors:
Via, GG [+details]

Abstract

In modern wafer processing for submicrometer lithographies, spray development offers many advantages over the old batch process using a recirculating development tank. In spray development, a fine mist of submicron aerosol particles is used to spray the developer (i.e., an aqueous solution of KOH or an organic solvent) over the surface of the wafer to be processed, while the wafer slowly rotates.