Coaxial Interconnections Using Advanced Metallurgy Technology
Original Publication Date: 1989-Sep-01
Included in the Prior Art Database: 2005-Jan-28
A technique is described whereby electro-migration failures of interlevel metal via interconnections is minimized through use of the Advanced METallurgy (AMET) technology. The technique is unique in that it produces coaxial interlevel metal vias, providing enhanced electro- migration resistance and connector redundancy in integrated circuit wiring.