Method to Produce Dual-Wavelength Masks
Original Publication Date: 1989-Sep-01
Included in the Prior Art Database: 2005-Jan-28
Disclosed is a method to generate a mask which can be used for resist compositions which are sensitive to two distinctly different bandwidths of radiation. There are three requirements for such a mask. One, some areas of the mask must transmit all light. Two, some areas of the mask must transmit no light. Three, selected areas of the mask transmit light of certain wavelengths but must not transmit light at all other wavelengths. Such a mask can be constructed by using a combination of dielectric and metal coatings.