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Method of Producing Defined Edge Profiles in Photoresist by Electron Beam Proximity Printing Lithography

IP.com Disclosure Number: IPCOM000036392D
Original Publication Date: 1989-Sep-01
Included in the Prior Art Database: 2005-Jan-29

Publishing Venue

IBM

Related People

Authors:
Bartha, J Haug, W Schoen, W Zapka, W [+details]

Abstract

Owing to its characteristic fine correction mode, electron-beam proximity printing (EBP) lithography permits the production of defined photoresist edge profiles by a number of staggered single scans.