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Process for Fabricating Small High Value Capacitors

IP.com Disclosure Number: IPCOM000036402D
Original Publication Date: 1989-Sep-01
Included in the Prior Art Database: 2005-Jan-29

Publishing Venue

IBM

Related People

Authors:
Leas, JM [+details]

Abstract

Process techniques are shown in the formation of capacitor dielectric by chemical vapor deposition (CVD) pyrolysis of titanium isopropoxide or the pyrolytic spray deposition of titanium isopropoxide.