Browse Prior Art Database

Wafer Centrality Inspection Machine

IP.com Disclosure Number: IPCOM000036553D
Original Publication Date: 1989-Oct-01
Included in the Prior Art Database: 2005-Jan-29

Publishing Venue

IBM

Related People

Authors:
Chan, SA Gasper, A Jordan, S Morgado, EJ Stewart, RA [+details]

Abstract

A technique is described whereby a centrality inspection machine measures the rotational misalignment and X/Y position offset patterns of wafers as used in the fabrication of semiconductor devices.