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Wafer Centrality Inspection Machine Disclosure Number: IPCOM000036553D
Original Publication Date: 1989-Oct-01
Included in the Prior Art Database: 2005-Jan-29

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Chan, SA Gasper, A Jordan, S Morgado, EJ Stewart, RA [+details]


A technique is described whereby a centrality inspection machine measures the rotational misalignment and X/Y position offset patterns of wafers as used in the fabrication of semiconductor devices.