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Photomasks With Integral Laser Mirrors and Calibration of Integral Laser Mirrors on Photomasks

IP.com Disclosure Number: IPCOM000036646D
Original Publication Date: 1989-Oct-01
Included in the Prior Art Database: 2005-Jan-29

Publishing Venue

IBM

Related People

Authors:
Doran, SK Kendall, RA [+details]

Abstract

When precision photomasks for microlithography are being used or generated, any relative motion between a photomask and laser mirrors on the X-Y stage results in placement and dimensional errors in the lithography. (Image Omitted)