Browse Prior Art Database

Light-Tight Cleanroom Gate Mechanism

IP.com Disclosure Number: IPCOM000036828D
Original Publication Date: 1989-Oct-01
Included in the Prior Art Database: 2005-Jan-29

Publishing Venue

IBM

Related People

Authors:
Baker, D Grau, P [+details]

Abstract

This article describes a light-tight cleanroom gate mechanism which provides access for a robot to load and unload semiconductor wafers to and from a process stage. The gate mechanism, when closed, provides a light-tight seal to the process chamber. When the gate mechanism is open, it allows access for an 8-inch semiconductor wafer and a robotic arm to access the process chamber. Because of the narrow profile of the gate mechanism, neither the motions of the robotic arm nor the process stage are impeded. In addition, the mechanism is designed to operate in a cleanroom environment by avoiding particle generation and keeping disturbances to cleanroom airflow at a minimum.