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Method for Suppressing Diffusion of Dopant From Doped Polysilicon to Silicide

IP.com Disclosure Number: IPCOM000036912D
Original Publication Date: 1989-Nov-01
Included in the Prior Art Database: 2005-Jan-29

Publishing Venue

IBM

Related People

Authors:
Tobimatsu, K [+details]

Abstract

This article describes a method for suppressing undesired diffusion of dopant from doped polysilicon to silicide by the provision of non- doped polysilicon therebetween.