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Technique for Selectively Removing Geometries From a Lithographically Defined Pattern Using a Modified Image Reversal Process

IP.com Disclosure Number: IPCOM000037133D
Original Publication Date: 1989-Nov-01
Included in the Prior Art Database: 2005-Jan-29

Publishing Venue

IBM

Related People

Authors:
Tornello, JA [+details]

Abstract

Disclosed is a process for subtracting geometries defined by one lithography mask from another lithography mask, where the two intersect using a modified Image Reversal Process (IRP).