Browse Prior Art Database

ELO Alignment Marks for Dual Subcollector Processes

IP.com Disclosure Number: IPCOM000037162D
Original Publication Date: 1989-Nov-01
Included in the Prior Art Database: 2005-Jan-29

Publishing Venue

IBM

Related People

Authors:
Burghartz, JN [+details]

Abstract

Epitaxial Lateral Overgrowth (ELO) over an oxide stripe is proposed in order to leave a gap as a mark for subsequent mask alignment and to avoid pattern distortion during the growth of the collector flatzone in bipolar dual-subcollector processes.