Browse Prior Art Database

Protection of Sensitive Materials During Photoresist Stripping

IP.com Disclosure Number: IPCOM000037338D
Original Publication Date: 1989-Dec-01
Included in the Prior Art Database: 2005-Jan-29

Publishing Venue

IBM

Related People

Authors:
Mann, RW [+details]

Abstract

To avoid damage to sensitive unprotected areas caused by standard photoresist stripping methods, an inorganic masking layer is used in a manner which provides protection for the sensitive materials during standard photoresist stripping.