The following operators can be used to better focus your queries.
( ) , AND, OR, NOT, W/#
? single char wildcard, not at start
* multi char wildcard, not at start
(Cat? OR feline) AND NOT dog?
Cat? W/5 behavior
(Cat? OR feline) AND traits
Cat AND charact*
This guide provides a more detailed description of the syntax that is supported along with examples.
This search box also supports the look-up of an IP.com Digital Signature (also referred to as Fingerprint); enter the 72-, 48-, or 32-character code to retrieve details of the associated file or submission.
Concept Search - What can I type?
For a concept search, you can enter phrases, sentences, or full paragraphs in English. For example, copy and paste the abstract of a patent application or paragraphs from an article.
Concept search eliminates the need for complex Boolean syntax to inform retrieval. Our Semantic Gist engine uses advanced cognitive semantic analysis to extract the meaning of data. This reduces the chances of missing valuable information, that may result from traditional keyword searching.
Disclosed is a device to accommodate a larger number of sputtering targets and to access any combinations of these targets in an ion beam system.
English (United States)
This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately
70% of the total text.
Page 1 of 2
Multiple Target Configuration for Ion Beam Deposition
Disclosed is a device to accommodate a larger number of sputtering targets
and to access any combinations of these targets in an ion beam system.
The configuration includes three parts: 1) a stationary ion source, 2) array of
target tiles attached to two linear motion bars location at opposite sides in a
vacuum chamber, and 3) an optional rotating substrate holder for better film
thickness and alloy composition uniformity.
Fig. 1 illustrated the location of targets with respect to the ion source and
substrate. Sputtering targets are mounted on each of long travel linear feed-
through (magnetically coupled feed through). The two arms are fed from opposite
sides of the vacuum chamber maintaining a small gap between two layers of
targets. A single target or two targets can be positioned under the ion source by
linear motion of the two arms. From this arrangement, it is possible to obtain any
combination of thin film compounds by overlapping any two or more targets
exposed to the ion beam flux.
Since the ion beam is a collimated ray of ions from the ion
source, the area exposed to the beam is sharply defined on the target
surface; therefore, only the target area exposed to the beam will be
sputtered. From Fig. 2, when the ion beam flux hits two targets, A
and B, the composition of sputtered material is determined by sputter
yield of materials, Y(A) and Y(B), and the area exposed to the ion
flux, S(A) and S(B). Spu...