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Preparation of Superconducting Thin Films by Spray Deposition

IP.com Disclosure Number: IPCOM000037443D
Original Publication Date: 1989-Jan-01
Included in the Prior Art Database: 2005-Jan-29

Publishing Venue

IBM

Related People

Authors:
Gupta, A Koren, G Moore, N [+details]

Abstract

Since the discovery of superconductivity at high temperatures in a class of materials containing copper oxide, the deposition of thin films of these materials which are superconducting has been demonstrated by a number of groups. Films which are typically 1 micron thick have been deposited by vacuum evaporation of the metals in presence of oxygen, magnetron and ion beam sputtering from a composite or dual targets, and by laser evaporation from a superconducting target. The deposited films have to be annealed under proper conditions to produce the superconducting phase. Thicker films (10-25 microns) have been deposited by plasma spraying a powder of the superconducting material followed by annealing.