Browse Prior Art Database

Reducing Contamination in Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems

IP.com Disclosure Number: IPCOM000037445D
Original Publication Date: 1989-Jan-01
Included in the Prior Art Database: 2005-Jan-29

Publishing Venue

IBM

Related People

Authors:
Delage, SL Iyer, SS Jousse, D Kanicki, J [+details]

Abstract

A technique is described whereby contamination and cleaning in plasma enhanced chemical vapor deposition (PECVD) systems are reduced through the use of silicon compounds.