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Reducing Contamination in Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems Disclosure Number: IPCOM000037445D
Original Publication Date: 1989-Jan-01
Included in the Prior Art Database: 2005-Jan-29

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Delage, SL Iyer, SS Jousse, D Kanicki, J [+details]


A technique is described whereby contamination and cleaning in plasma enhanced chemical vapor deposition (PECVD) systems are reduced through the use of silicon compounds.