Photoresist Storage Unit with Fast Heat-Up Cycle
Original Publication Date: 1989-Mar-01
Included in the Prior Art Database: 2005-Jan-29
This article discloses an apparatus for the storage and heating of photoresist material for semiconductor processing. For the longest storage shelf-life, it is desirable to keep photoresist material at cold temperatures, approximately 8oC. However, when in use, it is necessary to keep the photoresist at a warmer temperature, approximately 20oC to ensure adequate and reliable dispensing and lithographic properties.