Process for Combining Sets of Masking Images
Original Publication Date: 1989-Mar-01
Included in the Prior Art Database: 2005-Jan-29
A process for reducing the required number of masking levels in a semiconductor device is disclosed. Multiple sets of images are exposed in one photoresist level. One set of images is fully developed while other sets are partially developed. Partially developed images are then fully developed at a later time as needed.