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Thin Film Coating Technique

IP.com Disclosure Number: IPCOM000037575D
Original Publication Date: 1989-Mar-01
Included in the Prior Art Database: 2005-Jan-29

Publishing Venue

IBM

Related People

Authors:
Feder, R Hayden, C Spiller, EA [+details]

Abstract

Thin films can be deposited with uniform thickness in vacuum chambers having diameters not much larger than the diameter of the substrate being coated by using atomic and molecular reflection from the chamber sidewall to enhance the deposition rate near the outside edge of the work piece.