Browse Prior Art Database

Redesigned High Purity Process Gas Equipment to Improve Contamination Levels in Bipolar Processes

IP.com Disclosure Number: IPCOM000037613D
Original Publication Date: 1989-Apr-01
Included in the Prior Art Database: 2005-Jan-29

Publishing Venue

IBM

Related People

Authors:
Chahine, JJ Leidy, TS [+details]

Abstract

Modification of gas supply equipment is proposed to minimize particle contamination from high purity cylinder gases used for semiconductor processes as disclosed. The modification eliminates the source of contamination as opposed to trapping particles downstream of the equipment.