Redesigned High Purity Process Gas Equipment to Improve Contamination Levels in Bipolar Processes
Original Publication Date: 1989-Apr-01
Included in the Prior Art Database: 2005-Jan-29
Modification of gas supply equipment is proposed to minimize particle contamination from high purity cylinder gases used for semiconductor processes as disclosed. The modification eliminates the source of contamination as opposed to trapping particles downstream of the equipment.