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Enhanced Dry Stripping Process of Drill Smear in Multi-Layer Laminants Disclosure Number: IPCOM000037669D
Original Publication Date: 1989-May-01
Included in the Prior Art Database: 2005-Jan-29

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Related People

Clark, RJ Mlynko, WE Susko, RA [+details]


Disclosed is a method for enhanced etch speed and improved uniformity of etch in multi-layer laminants with formed through holes. This is accomplished as follows: (See Fig. 1). Panels are placed in a dry process chamber, preferably with RIE or microwave capability. A negative bias is applied to the internal ground and voltage planes in the laminated structure. This procedure forms a bias within each hole, especially toward the center of the specific hole. Application of bias to the panel can be accomplished through the addition of a test stud at the edge of each panel.