Browse Prior Art Database

Enhanced Dry Stripping Process of Drill Smear in Multi-Layer Laminants

IP.com Disclosure Number: IPCOM000037669D
Original Publication Date: 1989-May-01
Included in the Prior Art Database: 2005-Jan-29

Publishing Venue

IBM

Related People

Authors:
Clark, RJ Mlynko, WE Susko, RA [+details]

Abstract

Disclosed is a method for enhanced etch speed and improved uniformity of etch in multi-layer laminants with formed through holes. This is accomplished as follows: (See Fig. 1). Panels are placed in a dry process chamber, preferably with RIE or microwave capability. A negative bias is applied to the internal ground and voltage planes in the laminated structure. This procedure forms a bias within each hole, especially toward the center of the specific hole. Application of bias to the panel can be accomplished through the addition of a test stud at the edge of each panel.