Browse Prior Art Database

Method for Etching of Hafnium And Zirconium Oxide Metal Layers

IP.com Disclosure Number: IPCOM000037720D
Original Publication Date: 1989-Jun-01
Included in the Prior Art Database: 2005-Jan-29

Publishing Venue

IBM

Related People

Authors:
Grenon, BJ [+details]

Abstract

This article describes novel methods for etching hafnium (Hf) and zirconium (Zr) useful in the fabrication of excimer laser masks for semiconductor manufacturing.