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Optical System for Monitoring Plasma Processes

IP.com Disclosure Number: IPCOM000037731D
Original Publication Date: 1989-Jun-01
Included in the Prior Art Database: 2005-Jan-29

Publishing Venue

IBM

Related People

Authors:
Mlynko, WE Susko, RH [+details]

Abstract

Customarily, destructive methods have been used to monitor plasma hole clean effectiveness, i.e., the removal of drill smear. This practice is costly and time consuming. What is needed and what is provided by the present optical system is a real time, automatable process monitor for plasma hole clean applications. Moreover, the present system also is non-destructive.