Dismiss
The InnovationQ application will be updated on Sunday, May 31st from 10am-noon ET. You may experience brief service interruptions during that time.
Browse Prior Art Database

Alternative Solvents for Stripping Solvent Based Riston Photoresist

IP.com Disclosure Number: IPCOM000037741D
Original Publication Date: 1989-Jun-01
Included in the Prior Art Database: 2005-Jan-29

Publishing Venue

IBM

Related People

Authors:
Bhatt, AC Hovancik, CM Kuczynski, JP Papathomas, KI Trevitt, DJ [+details]

Abstract

Additive plating technology requires the use of solvent based Riston (Trademark of E. I. DuPont De Nemours & Co.) photoresists that have excellent resistance to alkaline media. The removal of such resist after plating is accomplished by the use of methylene chloride (MC) in a horizontal stripper. Due to environmental concerns MC may be banned in the near future. A number of other solvents can be used to replace MC, but the majority of them have been classified toxic and unsafe for use in the manufacturing environment.